STUDI DEPOSISI KERAMIK (YSZ) PADA BAJA FERITIK YTTRIA-STABILIZED ZIRCONIA SEBAGAI LAPISAN PELINDUNG YANG DITUMBUHKAN DENGAN PLD- PULSED LASER DEPOSITION; STUDY OF A YTTRIA-STABILIZED ZIRCONIA (YSZ) CERAMIC DEPOSITION ON A FERRITIC STEEL SUBSTRATE AS PROTECTIVE COATING GROWN WITH PLD – PULSED LASER DEPOSITION METHOD

Agustrisno, Edi Suharyadi

2015 | Disertasi | FMIPA

A thin film of Ytrria-Stabilized Zirconia has been deposited on a ferritic steel by Pulsed Laser Deposition (PLD) which the same crystal phase and stoichiometry with target material. The thin film was deposited with the chamber pressure range of 200-225 mTorr, repetation rate 10 Hz, the substrate temperature treatment (room temperature, annealing, non-annealing and 800oC) and the number of laser shots (3×104, 6×104 and 9×104). Furthermore, samples were analyzed using Optical Microscope (OM), Scanning Electron Microscope – Energy Dispersive Spectroscope (SEM-EDS), X-Ray Diffractometer (XRD), Atomic Force Microscope (AFM) and Vickers hardness tester. As a comparison thin film of YSZ was also deposited on a Si-wafer with number of shots 9×104, then characterized using AFM and XRD. The treatment of annealing and non-annealing show that cubic phase (111) was formed with the same crystallinities, but the position of peak (111) shift toward to the higher diffraction angle. On The substrate temperature treatment at 800oC yields roughness 68 nm and YSZ crystallinity was higher than the substrate at room temperature. The number of laser shots treatment show that the crystallinity, hardness properties, thickness and composition of Zr4+ dan Y3+ increase by the increasing a number of shots. Meanwhile, tetragonal zirconia phase in all number of shots was formed. The roughness was the range of 70 nm. The difference of the substrates shows that the crystallinity and roughness of the steel ferritic was higher than the Si-wafer substrate.

Kata Kunci : Thin film; Yttria-Stabilized Zirconia (YSZ); Pulsed Laser Deposition (PLD); ferritic steel; crystallinity; roughness