RANCANG BANGUN SPECTROSCOPIC ELLIPSOMETRY UNTUK MENGUKUR KONSTANTA DIELEKTRIK DAN KETEBALAN LAPISAN TIPIS GRAPHENE/SiO2 MENGGUNAKAN SUMBER CAHAYA PANJANG GELOMBANG TUNGGAL (632,8 nm); DESIGN SPECTROSCOPIC ELLIPSOMETRY TO MEASURE DIELECTRIC CONSTANTS AND THICKNESS OF GRAPHENE/SiO2 USING SOURCE LIGHT SINGLE WAVELENGTH (632,8 nm)
Megasari, Kiki, Kamsul Abraha
2015 | Disertasi | FMIPAThe measurement system for determining dielectric constant and thickness of graphene on SiO2/Silicon substrate using ellipsometry technique has been developed. The basic principle that used in spectroscopic ellipsometry (SE) is to analyze the changes in the phase difference ? and the amplitude ratio ? between p- and s- polarized reflected light. In this work, the SE configuration that had been used was Rotating Analyzer Ellipsometry (RAE) with He-Ne laser (wavelength = 632.5 nm) employed as a light source. This experiment using single wavelength (632.5 nm) and the angle of incidence at 60º, 62º, and 64º. The value of gold (Au) dielectric constants value obtained at those three incident angles were
Kata Kunci : dielectric constants; spectroscopic ellipsometry; Newton Raphson
